Transfert d'énergie Aryl-diazonium salts Etching Biomasse XPS TiO2 Selenization Argon InP chlorine etching inductive coupled plasma ICP modeling plasma sheath simulation PECVD Aluminium nitride Calcined clay CHLORINE PLASMAS B2 Semiconducting indium compounds Titanium dioxide A3 Physical vapor deposition processes TEM CIGSe Copper Atomic layer etching Semiconductors Sol-gel Avalanche breakdown Non-volatile memory Anatase AuCu alloy BOMBARDMENT B2 Quaternary Physical vapor deposition C Photoelectron spectroscopy Magnetron sputtering Nanocomposite 3 nm in size Residual stress Low-pressure plasma processing X-ray diffraction Plasma etching Chemical and biological sensors Oxides Thin films Carbon Amorphous B3 Solar cells AZO thin films CNTs’ collapse AlN Thin film Bipolar resistive switching BRS Adsorption Carbon nanotubes Buffer Couple Mott insulators Chalcogenide glass Chalcogenides B2 Semiconducting alloys A-CNx V2O3 Plasmas froids Carbon nitride Biofilms microbiens B1 Inorganic compounds Alzheimer's disease Functionalization CaTiO3Pr^3^+ A Chalcogenides Colloidal solution A Multilayers Cathepsin Sputtering Nanotubes Ambipolar material Optical properties Kirkendall effect Chalcogenide Amyloid precursor SF 6 Carbon Nanotube Atomic force microscopy NEXAFS CH4 Biocapteurs A1 Characterization Applications industrielles Scanning electron microscopy Films Band alignment Spectroscopic ellipsometry Transmission electron microscopy Capacitance Resistive switching Bixbyite X-ray photoelectron spectroscopy Structure Chemical detection A Thin films Alloying B Chemical synthesis Ablation laser Band gap Mott insulator Vanadium Sesquioxide